High Purity ITO Sputtering Target

Imported metals Indium ingot,Tin ingot and processed with Pure water, HCl and NH3 H2O Raw materials to form two powders of indium oxide and tin oxide.

They was mixed according to the actual requirements to obtain ITO powder(97:3, 95:5, 90:10 etc.).

ITO powder is molded by hydraulic pressing, cold Isostatic pressing densified, degreased and sintered to obtain a high-density, high-oxygen ITO target.

Then Machining, binding to get the final product.

Max Dimension of single target:

Planar:1,400*350mm (6~12mm),Max 2650mm

Rotary:  (In/Out) 135 Ф/ 147 ~ 157Ф(6~12mm),Single Length Max 500mm,Total Length Max 3191mm

Application of Products: 

ITO targets have been widely used in TN, STN-type liquid crystal display (LCD) , touch panel (TP), Heterojunction battery, and many other fields, and were generally praised by customers of the industry.